TbN is the common name for Terbium Nitride. Terbium nutride powder TbN is used to make high-end electronics and other specialty materials. Purity: 99.9%
Particle Size: -100 Mesh

About Terbium Nitride TbN Powder :

Physical properties:

Terbium nitride is a black solid with a high melting point and hardness. Its crystal structure is a cubic crystal system with lattice constant a=0.6856nm. With a density of 7.02g/cm³, terbium nitride has a high density and good thermal conductivity.

Chemical properties:

Terbium nitride has high chemical stability and corrosion resistance. At room temperature, it does not react with acids, bases, salts, etc. At high temperatures, terbium nitride can react with certain metals and alloys, but the reaction rate is slower. In addition, terbium nitride also has good oxidation resistance and vulcanization resistance.

Optical properties:

Terbium nitride has good optical properties, with high transmittance in the visible light range, low reflectance, and high absorption in the infrared light range. This makes terbium nitride have a wide range of applications in the optical field, such as optical components, optical Windows, lasers, and so on.

Mechanical properties:

Terbium nitride has high hardness, strength, and wear resistance. Its hardness is second only to diamond silicon carbide and other high-hardness materials. In addition, terbium nitride also has good toughness and fatigue resistance.

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Products Performance of Terbium Nitride powder TbN
Our TbN powder (CAS 13708-63-9) is high-purity, extremely fine, and has larger surface areas.

Terbium Nitride powder TbN technical data:

Part name	High purity Terbium Nitride powder
MF	TbN
Purity	99.9%
Particle size	-100 Mesh
Application	The powder Terbium Nitride TbN is used in high-end electronics and specialty materials. ;

Application of Terbium Nitride TbN Powder :

High-temperature structural materials:

Terbium nitride has the advantages of high melting point, high hardness, good chemical stability, and high-temperature strength, and it can be used as a high-temperature structural material. For example, terbium nitride can be used to manufacture high-temperature components such as high-temperature stoves, high-temperature bearings, high-temperature sealing materials, and high-temperature structural materials for the aerospace sector.

Electronic devices:

Terbium nitride has good electrical conductivity and stability and can be used as a coating material for electronic devices. For example, terbium nitride can be used as a surface coating for electronic devices, improving the performance and stability of the devices. In addition, terbium nitride can also be used as a radiator material for electronic devices, as well as optical Windows and optical components for manufacturing electronic devices.

Optical field:

Terbium nitride has good optical properties, with high transmittance in the visible light range, low reflectance, and high absorption in the infrared light range. This makes terbium nitride have a wide range of applications in the optical field, such as optical components, optical Windows, lasers, and so on. In addition, terbium nitride can also be used as a coating material for optical materials to improve the performance and stability of optical materials.

Catalyst and catalyst carrier:

Terbium nitride can be used as a catalyst and catalytic carrier. Because of its large specific surface area and good pore structure, terbium nitride can be used as a catalyst carrier in various chemical reactions, such as hydrocarbon cracking and ammonia synthesis. In addition, terbium nitride can also be used as a catalyst in electrode reactions in fuel cells.

Magnetic material:

Terbium nitride is a strong magnetic substance that can be used to manufacture magnetic materials and magnetic devices. For example, terbium nitride can be used to manufacture magnetic materials with high permeability, as well as to manufacture magnetic memory devices and magnetic sensors.

Aerospace field:

Terbium nitride plays an important role in the aerospace field. Because of its excellent high-temperature performance, it can maintain stable performance in high-temperature environments, so it is widely used in high-temperature structural materials in the aerospace field. For example, terbium nitride can be used in the manufacture of high-temperature components such as blades and combustion chambers for aircraft engines, as well as in the manufacture of rocket nozzles and aircraft surface coatings.

Biomedical field:

Terbium nitride is also widely used in the biomedical field. Because of its excellent biocompatibility and bioactivity, it can be used as a surface coating of biological materials to improve the biocompatibility and corrosion resistance of materials. In addition, terbium nitride can also be used as a drug carrier and biological imaging agent. For example, terbium nitride can be used in the preparation of medical devices such as biological implants and artificial.

Production Method of Terbium Nitride TbN Powder :

Direct nitriding method:

Direct nitriding is a common method to prepare terbium nitride powder. Its basic principle is to react terbium metal powder with nitrogen or ammonia at high temperatures to produce terbium nitride powder. This method can be performed at lower temperatures and pressures, with higher reaction rates and lower energy consumption. In the production process, the reaction temperature and atmosphere need to be controlled to ensure that the composition and properties of terbium nitride powder meet the requirements. In addition, high-purity terbium metal powder is needed as a raw material to avoid the effect of impurities on the properties of terbium nitride.

Hot pressure nitriding method:

Hot pressure nitriding is a method to prepare terbium nitride powder. The basic principle is to react terbium metal or its oxide powder with nitrogen or ammonia at high temperatures and high pressure to produce terbium nitride powder. This method can be carried out at higher temperatures and pressures, with higher reaction rates and lower energy consumption. In the production process, it is necessary to use high-temperature and high-pressure equipment for the reaction, and it is necessary to control the reaction temperature, pressure, and atmosphere parameters to ensure that the composition and performance of terbium nitride powder meet the requirements. In addition, it is necessary to use high-purity terbium metal or its oxide powder as a raw material to avoid the impact of impurities on the properties of terbium nitride.

Sputtering method:

Sputtering is a method for preparing terbium nitride thin films. The basic principle is to use high-energy particles or plasma to impact the surface of the terbium target so that the surface atoms or molecules are sputtered out and deposited on the substrate to form terbium nitride thin films. This method can produce high-quality terbium nitride films but requires the use of high-energy particles or plasma equipment for reaction, so the cost is higher. In addition, parameters such as reaction parameters and base temperature need to be controlled to ensure that the composition and properties of terbium nitride films meet the requirements.

Chemical vapor deposition method:

Chemical vapor deposition (CVD) is a method for preparing terbium nitride thin films. The basic principle is to react ammonia and terbium compounds to produce terbium nitride thin films at high temperatures. This method can produce high-quality terbium nitride films but requires the use of high-temperature equipment for the reaction, so the cost is higher. In addition, parameters such as reaction temperature and reactant concentration need to be controlled to ensure that the composition and properties of terbium nitride films meet the requirements.

Plasma-enhanced chemical vapor deposition method:

Plasma-enhanced chemical vapor deposition is a common method for preparing nitride films, including the preparation of terbium nitride films. This method combines plasma technology and chemical vapor deposition technology. It uses the high activity of plasma to accelerate the chemical reaction process so as to prepare high-quality nitride films at lower temperatures. This method has high film quality and deposition rate, and the equipment required is relatively simple, and the cost is low. In the preparation of terbium nitride thin films, it is necessary to select appropriate terbium source gas and nitrogen source gas and react and deposit under the action of plasma.

Packing & Terbium Nitride TbN Powder:
Many types of packaging are available depending on the amount TbN powder.
Packing of Terbium nitride TBN powder You can vacuum pack 1 kg/bag or 25 kg/barrel.
Shipment of Terbium nitride TBN powder: After receipt of payment, items may be shipped by express, airmail, or sea.

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Terbium Nitride Properties
Other Titles	TaN powder, Terbium(III), Nitride
	12033-64-6
Compound Formula	TbN
Molecular Weight	172.93
Appearance	Gray Black Powder
Melting Point	N/A
Boiling Point	N/A
Density	N/A
Solubility of H2O	N/A
Exact Size	172.928
Yttrium Nitride Safety & Health Information
Signal word	N/A
Hazard Statements	N/A
Hazard Codes	N/A
Risk Codes	N/A
Safety statements	N/A
Transport Information	N/A

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