TiN powder is the name given to titanium nitride. The melting point of TiN is higher than the melting points of other metal nitrides. However, it has a lower density, making it heat resistant. Purity: 99.5%
Particle Size: 1 to 3um
Description of Titanium Nitride (TiN) Powder：
Titanium Nitride formula: It is a good idea to use a bilingual translator, TiN. Titanium Nitride This ceramic coating is usually applied to titanium alloys, steels, carbides, and aluminum components in order to improve their surface properties. The Vickers Hardness of TiN ranges from 1800-2100. Its elastic modulus is 251GPa. Its coefficient of thermal expansion (COTE) is 9.35x10-6K-1. And its superconducting temperature is 5.6K.
Ti Nitride The oxidation temperature is 800degC. TiN Coating Color: The color is brownish-golden. According to laboratory testing, it is chemically resistant at temperatures of 20degC. However, at higher temperatures, concentrated acid solutions will cause it to slowly corrode. The friction coefficient of TiN with another TiN (unlubricated) varies depending on the material used and the surface finish. The typical TiN structure has a NaCl-type crystal structure, with a ratio stoichiometric of around 1:1. TiNx with x between 0.6 and 1.2 is thermodynamically stable.
TiN can become superconducting even at low temperatures. For single crystals, this temperature is up to 6.0K. The superconductivity in thin-film TiN has been extensively studied, and its superconductivity varies greatly depending on the sample preparation until the superconductivity in the superconductor-insulator transition is completely suppressed. After cooling the TiN to a value that was close to zero and converting it to the first super-insulator known, the resistance increased by 100,000.
Titanium nitride coat TiN ceramic is a hard material that can be used as a protective coating for titanium alloys, steels, carbides, or aluminum. Due to its golden surface, it is used in jewelry, high-performance ceramics, and medical equipment like scalpels and plastic bone saw blades. As well as being used for microelectronics, it can also be used to create electrodes or a conductive surface in bioelectronics.
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Direct nitriding method:
The direct nitriding method is a common method to prepare titanium nitride powder, and its basic principle is to react titanium metal powder with nitrogen or ammonia at high temperatures to produce titanium nitride powder. This method can be performed at lower temperatures and pressures, with higher reaction rates and lower energy consumption. In the production process, the reaction temperature and atmosphere need to be controlled to ensure that the composition and properties of titanium nitride powder meet the requirements. In addition, it is necessary to use high-purity titanium metal powder as a raw material to avoid the impact of impurities on the performance of titanium nitride.
Hot pressure nitriding method:
The hot pressure nitriding method is a method to prepare titanium nitride powder, and its basic principle is to react titanium metal or its oxide powder with nitrogen or ammonia at high temperature and high pressure to produce titanium nitride powder. This method can be carried out at higher temperatures and pressures, with higher reaction rates and lower energy consumption. In the production process, it is necessary to use high-temperature and high-pressure equipment for reaction, and it is necessary to control parameters such as reaction temperature, pressure, and atmosphere to ensure that the composition and performance of titanium nitride powder meet the requirements. In addition, it is necessary to use high-purity titanium metal or its oxide powder as a raw material to avoid the impact of impurities on the performance of titanium nitride.
Sputtering method:
The sputtering method is a method to prepare titanium nitride film. Its basic principle is to use high-energy particles or plasma to impact the surface of the titanium target so that the surface atoms or molecules are sputtered out and deposited on the substrate to form titanium nitride film. This method can produce high-quality titanium nitride films but requires the use of high-energy particles or plasma equipment for reaction, so the cost is higher. In addition, parameters such as sputtering parameters and substrate temperature need to be controlled to ensure that the composition and properties of titanium nitride films meet the requirements.
Chemical vapor deposition method:
Chemical vapor deposition (CVD) is a method for preparing titanium nitride films. The basic principle is to react ammonia and titanium compounds to produce titanium nitride films at high temperatures. This method can produce high-quality titanium nitride films but requires the use of high-temperature equipment for reaction, so the cost is higher. In addition, parameters such as reaction temperature and reactant concentration need to be controlled to ensure that the composition and properties of titanium nitride films meet the requirements.
| Product Name | MF | Purity | Particle Size |
Specific Surface Area
( m2/g ) |
Volume Density
( g/cm3 ) |
Crystal Form | Color |
| Titanium Nitride | TiN | 99% | 1-3um, 5-10um | 7.39 | 0.19 | Spherical | Gray-black |
| TiN | N | O | C | Fe | Al | Ca | Si | Ni |
| 99.5% | 21.5% | 0.6-1.2% | 0.1% | 0.015% | 0.01% | 0.01% | 0.30% | 0.3% |
High-performance ceramics and Composites:
Titanium nitride has the advantages of high hardness, high melting point, excellent chemical stability, and good thermal conductivity. It can be used as a raw material for the preparation of high-performance ceramics and composite materials. For example, titanium nitride can be used to manufacture ceramic tools, ceramic bearings, ceramic parts, and other high-performance ceramic products, as well as for the reinforcement phase to be added to metal, polymer, or carbon-based composites to improve the strength, hardness, and corrosion resistance of the material.
Electronic and optical materials:
Titanium nitride has good electrical conductivity and optical properties and can be used as electronic and optical materials. For example, titanium nitride can be used as a conductor material and a radiator material for electronic components, as well as for the manufacture of optical components and optical devices. In addition, titanium nitride can also be used as a coating material for electronic devices to improve their performance and stability.
Catalyst and catalyst carrier:
Titanium nitride can be used as a catalyst and catalytic carrier. Because of its excellent chemical stability, as well as large specific surface area and good pore structure, titanium nitride can be used as a catalyst carrier in various chemical reactions, such as hydrocarbon cracking, ammonia synthesis, and so on. In addition, titanium nitride can also be used as a catalyst in electrode reactions in fuel cells.
Aerospace field:
Titanium nitride plays an important role in the aerospace field. Because of its excellent high-temperature performance, it can maintain stable performance in high-temperature environments, so it is widely used in high-temperature structural materials in the aerospace field. For example, titanium nitride can be used to manufacture high-temperature components such as blades and combustion chambers for aircraft engines, as well as to manufacture rocket nozzles and aircraft surface coatings.
Biomedical field:
Titanium nitride is also widely used in the biomedical field. Because of its excellent biocompatibility and bioactivity, it can be used as a surface coating of biological materials to improve the biocompatibility and corrosion resistance of materials. In addition, titanium nitride can also be used as a drug carrier and biological imaging agent. For example, titanium nitride can be used in the preparation of medical devices such as biological implants and artificial joints and biomedical applications such as drug delivery and tumor diagnosis.
Titanium Nitride Properties |
|
| Other Names | Tinite, TiNite, TiN powder, nitridotitanium |
| CAS No. | 25583-20-4 |
| Compound Formula | TiN |
| Molecular Weight | 61.87 |
| Appearance | Brown Powder |
| Melting Point | N/A |
| Boiling Point | N/A |
| Density | 5.24 g/cm3 |
| Solubility in H2O | N/A |
| Exact Mass | 61.951 |
Titanium Nitride Health & Safety Information |
|
| Signal Word | N/A |
| Hazard Statements | N/A |
| Hazard Codes | N/A |
| Risk Codes | N/A |
| Safety Statements | N/A |
| Transport Information | N/A |
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